منابع مشابه
Resist-free antireflective nanostructured film fabricated by thermal-NIL
Resist-free antireflective (AR) nanostructured films are directly fabricated on polycarbonate (PC) film using thermal-nanoimprint lithography (T-NIL) and the moth-eye shape of AR nanostructure is elaborately optimized with different oxygen reactive ion etching conditions. Anodic aluminum oxide (AAO) templates are directly used as master molds of T-NIL for preparation of AR nanostructures on PC ...
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In this article we report on the fabrication of subwavelength antireflection structures on silicon substrates using a trilayer resist nanoimprint lithography and liftoff process. We have fabricated cone-shaped nanoscale silicon pillars with a continuous effective index gradient, which greatly enhances its antireflective performances. Our measurements show that the two-dimensional subwavelength ...
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Abstract UV LIGA involves the exposure of SU-8 negative resist, using a UV mask aligner, to produce high aspect ratio pillars or microchannels as part of the manufacturing process for microsystems. This has been made possible by the widespread use of a UV sensitive resist SU-8. Many papers have been written on the Fresnel diffraction theory of exposure, some key properties of SU-8 and prototype...
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This paper will describe how a gate electrode formation process in a GaAs FET device was analyzed and optimized for increased CD control and product throughput. Optimizations included a new resist in the photolithography process, a new solvent and equipment type in the metal liftoff process, and a new dome structure in the metal deposition process. These process optimizations resulted in a gate...
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Background & Aims of the Study: Malachite Green (MG) is the most commonly used substance for dying cotton, food & pharmacy industries, paper, leather and silk. On inhalation it can cause difficult breathing, while on the direct contact it may cause permanent injury of the eyes of human and animals, burning sensations, nausea, vomiting, profuse sweating, mental confusion and met...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2010
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.23.87